WS Investor
09 Apr 2026, 22:43
Applied Materials Unveils New Systems for Next-Generation AI Chips
Applied Materials introduced two advanced deposition systems designed to support production of cutting-edge logic chips at 2nm and beyond.
The new technologies target Gate-All-Around (GAA) transistor architectures, enabling atomic-scale precision in material deposition to improve chip performance and energy efficiency. The Precision Selective Nitride system enhances transistor isolation, reducing power loss, while the Trillium ALD system enables highly uniform metal gate structures critical for advanced chip functionality.
The systems are already being adopted by leading chipmakers and are aimed at supporting the growing demand for AI computing, where performance and power efficiency are increasingly driven by materials engineering rather than traditional scaling alone.
Applied Materials said the innovations will help manufacturers build more powerful and efficient processors, supporting the next phase of AI infrastructure development.
Globe Newswire
Applied Materials introduced two advanced deposition systems designed to support production of cutting-edge logic chips at 2nm and beyond.
The new technologies target Gate-All-Around (GAA) transistor architectures, enabling atomic-scale precision in material deposition to improve chip performance and energy efficiency. The Precision Selective Nitride system enhances transistor isolation, reducing power loss, while the Trillium ALD system enables highly uniform metal gate structures critical for advanced chip functionality.
The systems are already being adopted by leading chipmakers and are aimed at supporting the growing demand for AI computing, where performance and power efficiency are increasingly driven by materials engineering rather than traditional scaling alone.
Applied Materials said the innovations will help manufacturers build more powerful and efficient processors, supporting the next phase of AI infrastructure development.
Globe Newswire